EPMA-8050G Electron Probe Microanalyzer

Debut of the Grand EPMA

With a Cutting-Edge FE Electron
Optical System,
the Ultimate in Advanced
Shimadzu EPMA Analysis Performance

This instrument is equipped with a cutting-edge FE electron optical system, which provides unprecedented spatial resolution under all beam current conditions, from SEM observation conditions up to 1 μA order. Integration with high performance X-ray spectrometers that Shimadzu has fostered through the companys traditions achieves the ultimate advance in analysis performance.

It is certainly appropriate to call this the grand EPMA, the debut of the ultimate EMPA system.

Highest Secondary-Electron Image Resolution of 3 nm

This is a sample observation of gold particle deposition on carbon. A maximum resolution of 3 nm (at 30 kV) is achieved. The beam is focused even at a comparatively large beam current, so a smooth, high-resolution SEM image is easily obtained. 

Ultra High Sensitivity Mapping

A mapping analysis of stainless steel was performed with a beam current of 1 μA at a magnification of 5,000x. (Left) The distribution of phases with slightly different Cr concentrations is precisely captured. (Right) The system succeeds in visualizing a distribution of Mn content under 0.1 %.

1 High-Brightness Schottky Emitter

A high output Schottky emitter with a larger tip diameter than ordinarily used in SEMs is adopted for the FE electron gun. A stable electron beam is obtained that while bright has the large current indispensable for high sensitivity analysis.

2 Special EPMA Electron Optical System

The electron optical system has a proprietary configuration and control method (Japan Patent No. 4595778). The condenser lens is set as close as possible to the electron gun. Crossover is formed not with the condenser lens but with an iris lens, with the objective aperture arranged at the same position. While this is a simple lens configuration, a large current can be obtained. At the same time, the angular aperture can be optimally configured under all current conditions, minimizing the electron beam diameter. Naturally, there is no need to replace the objective aperture.

3 Ultra High Vacuum Evacuation System

A two-stage differential evacuation system has been adopted, partitioned at the orifices between the electron gun chamber, intermediate chamber, and analysis chamber. Minimizing the orifice between the intermediate chamber and analysis chamber limits the flow of gas to the intermediate chamber. The electron gun chamber is always maintained at an ultra high vacuum level, stabilizing emitter operation.

4 X-Ray Spectrometers with High Sensitivity

The system can be equipped with up to five 4-inch X-ray spectrometers which provide both high sensitivity and high resolution.

The 52.5° X-ray take-off angle enhances the spatial resolution of the X-ray signal, while enabling high sensitivity analysis with minimal X-ray absorption by the sample.

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